MOLYBDENUM-NIOBIUM ALLOYS, SPUTTERING TARGETS CONTAINING SUCH ALLOYS, METHODS OF MAKING SUCH TARGETS, THIN FILMS PREPARED THEREFROM AND USES THEREOF

摘要

Alloys comprising: (a) molybdenum present in a majority portion; (b) niobium present in an alloying amount; and (c) a third metal selected from the group consisting of nickel, chromium, titanium, zirconium, hafnium, vanadium and mixtures thereof, wherein the third metal is present in a doping amount; along with sputtering targets prepared therewith, films sputtered using such targets and thin film devices containing such films.