| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing of a diffusion layer for photovoltaics, easily forming the diffusion layer for photovoltaics using a selective emitter, and also to provide a method for manufacaturing of solar cell. <P>SOLUTION: This method includes processes of: forming a water repellent agent layer on the surface of a phosphorus glass layer of a silicon substrate with a phosphorus-diffused layer which phosphorus is diffused into and the phosphorus glass layer in this order, by applying a water repellent agent to the surface of the phosphorus glass layer; irradiating the silicon substrate having the water repellent agent layer with a laser to eliminate the water repellent agent layer and at least a part of the phosphorus glass layer in a predetermined pattern region; selectively applying a phosphoric acid or a phosphoric acid solution to the determined pattern region by applying the phosphoric acid or the phosphoric acid solution to the surface of the silicon substrate which has been irradiated with the laser; forming a low-resistance diffusion layer by heat-treating the silicon substrate which the phosphoric acid or the phosphoric acid solution has been applied to. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
