发明名称 METHOD OF MANUFACTURING HIGH-PURITY GAS-FILLED VESSEL, AND HIGH-PURITY GAS-FILLED VESSEL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a high-purity gas-filled vessel and a high-purity gas-filled vessel, preventing a decrease in purity of gas filled into the high-purity gas-filled vessel. <P>SOLUTION: In this method of manufacturing the high-purity gas-filled vessel, the high-purity gas-filled vessel is pressured in a test by hydraulic pressure in a pressure test process. In a grinding process, the inner surface of the high-purity gas-filled vessel is ground after the pressure test process, thereby, the total length of a minute crack per square centimeter within a range of depth of 1-30μm from the inner surface of the high-purity gas filled-vessel does not exceed 30 cm. In a cleaning process, the inner surface of the high-purity gas-filled vessel is cleaned without performing the pressure test with respect to the high-purity gas-filled vessel after the grinding process. In a drying process, the inner surface of the high-purity gas-filled vessel is dried without performing the pressure test with respect to the high-purity gas-filled vessel after the cleaning process. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009243691(A) 申请公布日期 2009.10.22
申请号 JP20090170628 申请日期 2009.07.21
申请人 MITSUI CHEMICALS INC;MCC KOGYO:KK 发明人 YOSHIKAWA AKIO;KANAYAMA SHIGEO;HARADA ISAO
分类号 F17C1/00;B24B31/00 主分类号 F17C1/00
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