发明名称 DISPLACEMENT DETECTING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a displacement detecting apparatus can prevent an effect of contaminations deposited on the surface of a glass substrate for example, and detect a displacement of a surface position of the glass substrate with high accuracy. <P>SOLUTION: The displacement detecting apparatus for detecting a displacement of a surface position of a surface to be inspected 20a, includes an irradiation system (IL: 1, 2, 3, 4, 5) for irradiating a surface of an object 20 as the surface to be inspected, after a focal point P is formed once by an objective lens 5 based on light from a light source LS, and a detection system (DS: 5, 4, 3, 6, 7, 8, 9) for detecting the displacement of the surface position of the surface to be inspected based on light reflected by the surface to be inspected and allowed to pass through the objective lens. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009236653(A) 申请公布日期 2009.10.15
申请号 JP20080082496 申请日期 2008.03.27
申请人 NIKON CORP 发明人 SHODA TAKAHIRO
分类号 G01B11/00;G01C3/06;G03F7/20;H01L21/027 主分类号 G01B11/00
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