发明名称 GUARD RING STRUCTURES FOR HIGH VOLTAGE CMOS/LOW VOLTAGE CMOS TECHNOLOGY USING LDMOS (LATERAL DOUBLE-DIFFUSED METAL OXIDE SEMICONDUCTOR) DEVICE FABRICATION
摘要 A semiconductor structure. The semiconductor structure includes a semiconductor substrate, a first transistor on the semiconductor substrate, and a guard ring on the semiconductor substrate. The semiconductor substrate includes a top substrate surface which defines a reference direction perpendicular to the top substrate surface. The guard ring includes a semiconductor material doped with a doping polarity. A first doping profile of a first doped transistor region of the first transistor in the reference direction and a second doping profile of a first doped guard-ring region of the guard ring in the reference direction are essentially a same doping profile. The guard ring forms a closed loop around the first transistor.
申请公布号 US2009236662(A1) 申请公布日期 2009.09.24
申请号 US20090475661 申请日期 2009.06.01
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 VOLDMAN STEVEN HOWARD
分类号 H01L29/78 主分类号 H01L29/78
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