发明名称 DEVICE FOR VAPOR DEPOSITION OF THIN FILM
摘要 PURPOSE:To ionize clusters efficiency and to vapordeposit an uniform thin film on a substrate by providing plural converging electrodes above a crucible for generating clusters so as to attract thermions toward a nozzle of the crucible for converging. CONSTITUTION:Thermions e<-> are attracted from filaments 9 and fly to a nozzle 4a of a crucible 4. In the vicinity of the nozzle 4a, a diameter of a cluster beam 17 is small and thermions are bombarded against the clusters with a high probability. As a result, ionization of the cluster is performed efficiently and uniformly. Accordingly, a thin film formed on a substrate 18 becomes uniform in its thickness and quality.
申请公布号 JPS60124918(A) 申请公布日期 1985.07.04
申请号 JP19830235567 申请日期 1983.12.12
申请人 MITSUBISHI DENKI KK 发明人 YAMANISHI KENICHIROU;SHIYUHARA AKIRA;MINOWA YOSHIFUMI;KOU SANJIYU;HANAI MASAHIRO
分类号 C23C14/24;C23C14/32;H01L21/203 主分类号 C23C14/24
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