发明名称 Memory using variable tunnel barrier widths
摘要 A memory using a tunnel barrier that has a variable effective width is disclosed. A memory element includes a tunneling barrier and a conductive material. The conductive material typically has mobile ions that either move towards or away from the tunneling barrier in response to a voltage across the memory element. A low conductivity region is either formed or destroyed. It can be formed by either the depletion or excess ions around the tunneling barrier, or by the mobile ions combining with complementary ions. It may be destroyed by either reversing the forming process or by reducing the tunneling barrier and injecting ions into the conductive material. The low conductivity region increases the effective width of the tunnel barrier, making electrons tunnel a greater distance, which reduces the memory element's conductivity. By varying conductivity multiple states can be created in the memory cell.
申请公布号 US2009231906(A1) 申请公布日期 2009.09.17
申请号 US20090454698 申请日期 2009.05.21
申请人 UNITY SEMICONDUCTOR CORPORATION 发明人 RINERSON DARRELL;CHEVALLIER CHRISTOPHE;KINNEY WAYNE;WARD EDMOND
分类号 G11C11/00;G11C7/00 主分类号 G11C11/00
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