| 发明名称 |
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD |
| 摘要 |
<p>A film deposition apparatus which comprises: a treatment vessel having a space inside which serves as a vacuum space to which a film-depositing gas is supplied; a substrate-holding part which is disposed in the vacuum space and holds a substrate; a coil which inductively heats the substrate-holding part to thereby form a film from the film-depositing gas on the substrate and which has been divided into regions; and a coil control part which controls the coil region by region.</p> |
| 申请公布号 |
EP2101345(A1) |
申请公布日期 |
2009.09.16 |
| 申请号 |
EP20070832784 |
申请日期 |
2007.11.29 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MORISAKI, EISUKE;KOBAYASHI, HIROKATSU;YOSHIKAWA, JUN |
| 分类号 |
H01L21/205;C23C16/46;H05B6/06;H05B6/10;H05B6/44 |
主分类号 |
H01L21/205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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