摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thermal spray coating member having excellent appearance which is suitable for the reaction vessel of a semiconductor machining apparatus or the like, and its manufacturing method. <P>SOLUTION: In the thermal spray coating member having excellent appearance, the surface of a base material is covered with a thermal spray deposit film of REM oxide, and porosity of a dense structure formed in an area of ≤50 μm in depth from the outer surface of the spray deposit film is ≤1%, the dense structure is transparent or white, and roughness of the outer surface of the thermal spray deposit film is in a range of Ra 1-3 μm. <P>COPYRIGHT: (C)2009,JPO&INPIT |