发明名称 |
METHOD FOR PRODUCING METAL NITRIDE FILM, OXIDE FILM, METAL CARBIDE FILM OR COMPOSITE FILM OF THEM, AND PRODUCTION APPARATUS THEREFOR |
摘要 |
Disclosed is a method for producing a film selected from the group consisting of a metal nitride film, a metal oxide film, a metal carbide film and a film of composite material thereof. The method for producing a film comprises a first step wherein a metal film is formed on a substrate by physical vapor deposition, and a second step wherein a radical, which is produced by bringing a raw material gas containing an atom selected from the group consisting of a nitrogen atom, an oxygen atom and a carbon atom into contact with a metal catalyst, is reacted with the metal film. This method for producing a film enables to form a thin metal nitride film or the like having low resistance by easily causing a radical reaction even without heating or heating at low temperatures, since the metal film is formed by physical vapor deposition without using a chemical reaction, and then an energetically activated radial is reacted with the metal film.
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申请公布号 |
US2009202807(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20070308702 |
申请日期 |
2007.06.22 |
申请人 |
NATIONAL KUNIVERSITY CORPORATION KITAMI INSTITUE OF TECHNOLOGY |
发明人 |
TAKEYAMA MAYUMI;NOYA ATSUSHI |
分类号 |
B32B5/00;B32B9/00;C23C14/34;C23C14/56 |
主分类号 |
B32B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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