发明名称 |
Method of Double Patterning, Method of Processing a Plurality of Semiconductor Wafers and Semiconductor Device |
摘要 |
A method of double patterning is disclosed. The method includes forming a first photosensitive layer; exposing the first photosensitive layer using a first reticle; developing the first photosensitive layer thereby forming a first image pattern including first elements; forming a second photosensitive layer; exposing the second photosensitive layer using the first reticle; and developing the second photosensitive layer thereby forming a second image pattern. |
申请公布号 |
US2009194840(A1) |
申请公布日期 |
2009.08.06 |
申请号 |
US20080024872 |
申请日期 |
2008.02.01 |
申请人 |
|
发明人 |
NOELSCHER CHRISTOPH;CHIU YI-MING;WU YUAN-HSUN |
分类号 |
G03F7/30;G03F7/26;H01L21/30;H01L27/00 |
主分类号 |
G03F7/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|