发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor light-emitting device including a Pd electrode, which prevents, in a simple manner, yield deterioration resulting from sticking of the Pd electrode on a detached insulating film onto the surface of the semiconductor light-emitting device, or the occurrence of portions where pad electrodes are not formed, and avoid a contact of a p-type contact layer with the pad electrode. <P>SOLUTION: The method includes the steps of forming an insulating film having an opening on a semiconductor, forming a Pd electrode in the opening and on the insulating film, and detaching and removing the Pd electrode on the insulating film by applying a physical force to the Pd electrode on the insulating film while leaving the Pd electrode in the opening. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009177141(A) 申请公布日期 2009.08.06
申请号 JP20080310062 申请日期 2008.12.04
申请人 MITSUBISHI ELECTRIC CORP 发明人 OKA TAKAIKU;KUSUNOKI MASATSUGU;KAWASAKI KAZUE;ABE SHINJI;SAKUMA HITOSHI
分类号 H01L33/20;H01L33/32;H01L33/36;H01L33/40;H01L33/44;H01S5/042 主分类号 H01L33/20
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