发明名称 APPARATUS AND METHOD FOR SUPPLYING STAMP IN IMPRINTING PROCESS
摘要 <p>An apparatus and a method for supplying a stamp in an imprinting process are provided to improve precision in a next implant process by supplying a stamp to a rest of the stamp firstly and transferring it to chamber lid. A chamber base(100) supports a substrate coated by a photocurable resin to form a fine pattern, and a chamber lid is manufactured to be adhered closely to the upper part of the chamber base to form a airtight space. A stamp supporting part(111) is installed at the chamber lid, and a pattern is implanted on a substrate while the stamp supporting part supports the stamp made of photocurable resin to be detachable. A plate stamp rest(120) provides a stamp when the chamber lid is separated from the camber base while being installed under the chamber lid. The one side of a nozzle(123) is opened to top of the stamp rest and the other side is extended to the outside through a stamp rest.</p>
申请公布号 KR20090070008(A) 申请公布日期 2009.07.01
申请号 KR20070137858 申请日期 2007.12.26
申请人 ADP ENGINEERING CO., LTD. 发明人 CHOI, JUNG SU;KWON, GYU HO;AHN, HYUN HWAN;LIM, YONG JIN;KIM, EUN SUK
分类号 H01L21/027 主分类号 H01L21/027
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