| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound useful as an acid-generating agent for a resist composition, a compound useful as a precursor to the above compound, an acid generating-agent, a resist composition, and a method of forming a resist pattern. <P>SOLUTION: A compound represented by formula (I) is disclosed. A compound represented by formula (b1-1) is disclosed. In the formulae, Q<SP>1</SP>represents a divalent linking group or a single bond; Y<SP>1</SP>represents an alkylene group that may contain a substituent, or a fluorinated alkylene group that may contain a substituent; X represents a 5-30C aromatic cyclic group that contains a fluorine atom and may contain a substituent; M<SP>+</SP>represents an alkali metal ion; and A<SP>+</SP>represents an organic cation. <P>COPYRIGHT: (C)2009,JPO&INPIT |
