| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method for observing defects by using a charged particle beam system. SOLUTION: Imprecisely located defects are imaged by milling a series of slices and performing a light, preferential etching to provide a topographical interface between materials having similar secondary electron emission characteristics. The slices are sufficiently small to capture small defects, but are sufficiently large to overcome problems with redeposition. COPYRIGHT: (C)2009,JPO&INPIT |
