HIGH VOLTAGE SEMICONDUCTOR DEVICE

摘要

This invention describes implementation of medium/high voltage semiconductor devices with a better voltage-blocking capability versus specific on-resistanse trade off. This approach can be implemented in baseline and submicron CMOS without any additional process steps. Said devices comprise dielectric regions and semiconductor regions formed between them. Conductive extentions are formed on the dielectric regions, said extentions interacting capacitively with the semiconducter regions.