发明名称 Process for forming a bump structure and bump structure
摘要 A method for forming a bump structure and a bump structure for conductive interconnection with another element having at least one of microelectronic devices or wiring thereon, used as an electric connection in an electronic circuit, includes the steps of forming a mandrel by steps including forming at least one opening extending through a bump-forming die body in the thickness direction thereof and positioning a bump-forming die lid on a surface of the bump-forming die body so as to cover one end of the opening and to thereby define a bump-forming recess. The bump-forming die body may be comprised of a metal sheet. A metal layer is formed at least on an inner surface of the bump-forming die lid exposed within the bump-forming recess. The mandrel is removed so as to expose the metal layer and form a bump structure.
申请公布号 US2009121351(A1) 申请公布日期 2009.05.14
申请号 US20080290873 申请日期 2008.11.04
申请人 TESSERA INTERCONNECT MATERIALS, INC. 发明人 ENDO KIMITAKA
分类号 H01L23/48;H01L21/44 主分类号 H01L23/48
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