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发明名称
Multilayer active mask lithography
摘要
An active mask emits a patterned energy flux in response to an energy input.
申请公布号
US2009117475(A1)
申请公布日期
2009.05.07
申请号
US20080287682
申请日期
2008.10.10
申请人
SEARETE LLC, A LIMITED LIABILITY CORPORATION OF THE STATE OF DELAWARE
发明人
HYDE RODERICK A.;MYHRVOLD NATHAN P.
分类号
G03F1/00
主分类号
G03F1/00
代理机构
代理人
主权项
地址
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