发明名称 |
Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor |
摘要 |
The present invention comprises a field enhanced electrode package for use in a non-thermal plasma processor. The field enhanced electrode package includes a high voltage electrode and a field-enhancing electrode with a dielectric material layer disposed in-between the high voltage electrode and the field-enhancing electrode. The field-enhancing electrode features at least one raised section that includes at least one injection hole that allows plasma discharge streamers to occur primarily within an injected additive gas.
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申请公布号 |
US7521026(B2) |
申请公布日期 |
2009.04.21 |
申请号 |
US20040017392 |
申请日期 |
2004.12.20 |
申请人 |
LOS ALAMOS NATIONAL SECURITY, LLC |
发明人 |
ROSOCHA LOUIS A.;FERRERI VINCENT;KIM YONGHO |
分类号 |
B01J19/08;B01D53/32;H01J37/32 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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