发明名称 Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor
摘要 The present invention comprises a field enhanced electrode package for use in a non-thermal plasma processor. The field enhanced electrode package includes a high voltage electrode and a field-enhancing electrode with a dielectric material layer disposed in-between the high voltage electrode and the field-enhancing electrode. The field-enhancing electrode features at least one raised section that includes at least one injection hole that allows plasma discharge streamers to occur primarily within an injected additive gas.
申请公布号 US7521026(B2) 申请公布日期 2009.04.21
申请号 US20040017392 申请日期 2004.12.20
申请人 LOS ALAMOS NATIONAL SECURITY, LLC 发明人 ROSOCHA LOUIS A.;FERRERI VINCENT;KIM YONGHO
分类号 B01J19/08;B01D53/32;H01J37/32 主分类号 B01J19/08
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