| 摘要 |
<p>An illumination optical system, the exposure apparatus and device manufacturing method are provided to control the polarization state of the partial area of one group by one polarization control unit and to obtain the target polarization condition of the high polarization. The first polarized light control unit(2') is arranged between the cavity of the illumination optical system and light source. The second polarized light control unit(9') is arranged between the first polarized light control unit and cavity. The cavity comprises a plurality of partial areas. A plurality of partial areas is classified as the first group and the second group. The first group comprises the partial area. The second group comprises the partial area and the other partial area. The second polarized light control unit controls the polarization state of the partial area of the second group.</p> |
