LITHOGRAPHIC METHOD BY ELECTRICALLY CHARGED PARTICLE BEAMS

摘要

PROBLEM TO BE SOLVED: To provide a lithographic method to eliminate the negative effects due to deterioration of beam resolution by the space charge effect of beams shaped by first and second shaping apertures.

SOLUTION: The lithographic method includes a first irradiation process for irradiating a first charged particle beam having a first shape formed by passing beams through first and second shaping apertures to a sample, and a second irradiation process for irradiating a second charged particle beam having a second shape formed by passing beams through a shaping aperture made by turning respective sides of the first shape to the first beam irradiation site of the sample in an overlapping manner.

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