发明名称 APPARATUS FOR DISPENSING GAS AND CHAMBER WITH THE SAME
摘要 A gas inlet manifold (20, 32) for a plasma chamber (10) having a perforated gas distribution plate (20) suspended by flexible side walls (24). The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provides thermal isolation between the gas distribution plate and other components of the chamber. <IMAGE>
申请公布号 KR100882072(B1) 申请公布日期 2009.02.10
申请号 KR20060108003 申请日期 2006.11.02
申请人 发明人
分类号 B01J19/08;H01L21/205;C23C16/44;C23C16/455;C23C16/509;H01J37/32;H01L21/302;H01L21/3065;H01L21/31 主分类号 B01J19/08
代理机构 代理人
主权项
地址