| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold-forming composition for nano-imprints having high hardness, a mold for nano-imprints using the composition and a method of manufacturing the mold. SOLUTION: A composition for nano-imprinting comprising (a) a multi-functional epoxy resin, (b) a cationic polymerization initiator and (c) a solvent can be used for forming a resin pattern having high hardness, and a substrate having a resin pattern which is simply formed thereon provides a mold suitable for nano-imprinting. COPYRIGHT: (C)2009,JPO&INPIT
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