| 摘要 |
PURPOSE:The titled polymer which is a new compound which is soluble in usual organic solvents, has a high glass transition point, is capable of easily forming excellent films having extremely excellent resistance to irradiation with oxygen plasma and has excellent properties as a resist material. CONSTITUTION:The titled polymer is a silicon atom-containing styrenic polymer consisting of structural units of the formula, wherein R is a lower alkyl group such as methyl, ethyl or propyl, X and Y are each the number of moles of each unit, and A is a monomer unit consisting of a structure derived by polymerization of at least one ethylenically unsaturated compound. Examples of the A include acrylic and methacrylic acid derivatives. |
