| 摘要 |
<p>A gas plasma generating system comprises a resonant cavity (11) for connection to a source (1) of very high frequency power. A plasma cavity (12) defined by an electrically non-conductive material such as ceramic is positioned within the resonant cavity (11) for containing an ionisable gas such that in use a plasma is formed in the plasma cavity (12), the cavity having an exit opening (23) to enable plasma to exit from the system.</p> |
