| 摘要 |
A method of making a coated body wherein the method includes the following steps: providing a substrate; applying by chemical vapor deposition a titanium carbonitride coating layer containing titanium carbonitride grains for a selected duration so as to terminate the growth of the titanium carbonitride grains at a pre-selected size and control the thickness of the titanium carbonitride coating layer so as to range between a lower limit equal to about 0.5 micrometers and an upper limit equal to about 25 micrometers; applying by chemical vapor deposition a first titanium/aluminum-containing coating layer containing first titanium/aluminum-containing grains for a selected duration so as to terminate the growth of the first titanium/aluminum-containing grains at a pre-selected size and control the thickness of the first titanium/aluminum-containing coating layer so as to range between a lower limit equal to greater than zero micrometers and an upper limit equal to about 5 micrometers, and wherein the first titanium/aluminum-containing coating layer is farther from the substrate than the titanium carbonitride coating layer; applying by chemical vapor deposition an alumina coating layer containing alumina grains for a selected duration so as to terminate the growth of the alumina grains at a pre-selected size and control the thickness of the alumina coating layer so as to range between a lower limit greater than zero micrometers and an upper limit equal to about 5 micrometers, and the alumina coating layer being farther away from the substrate than the first aluminum/titanium-containing coating layer, and wherein the first titanium-containing coating layer and the alumina coating layer comprising a coating sequence, and the method comprises applying a plurality of the coating sequences by CVD.
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