Method of Forming Insulator Layer and Method of Manufacturing Non-Volatile Memory Device Using the same,申请号KR20040038901-传众专利搜索

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发明名称	Method of Forming Insulator Layer and Method of Manufacturing Non-Volatile Memory Device Using the same
摘要
申请公布号	KR100596484(B1)	申请公布日期	2006.07.03
申请号	KR20040038901	申请日期	2004.05.31
申请人		发明人
分类号	H01L27/115;H01L21/314;H01L21/316;H01L21/336;H01L21/4763;H01L21/8247	主分类号	H01L27/115
代理机构		代理人
主权项
地址

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