发明名称 Low thermal budget fabrication method for a mask read only memory device
摘要 A low thermal budget fabrication method for a mask ROM is described. The method includes providing a substrate having a gate oxide layer thereon. A first conductive layer is formed on the gate oxide layer. A plurality of bit lines is formed in the substrate. A second conductive layer is then formed on the first conductive layer, followed by forming a plurality of ROM codes in the substrate.
申请公布号 US7442610(B2) 申请公布日期 2008.10.28
申请号 US20020156323 申请日期 2002.05.24
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 HUANG SHUI-CHIN;PAN JEN-CHUAN
分类号 H01L21/8234;H01L21/8246;H01L27/112 主分类号 H01L21/8234
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