PATTERN FORMING METHOD, IMPRINT MOLD AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method suppressing drawing abnormality of a pattern due to charges and suitable for forming a multi-level fine three-dimensional structural pattern.

SOLUTION: The pattern forming method is characterized in that a resin layer comprising a resin having conductivity and insoluble with water is formed on a substrate having level differences. Because the resin layer burying the level differences is insoluble with water and has conductivity, the resin layer acts as an antistatic layer. Upon patterning by use of a charged particle beam, occurrence of drawing abnormality in a resist on the resin layer can be suppressed.

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