发明名称 |
MANUFACTURING METHOD OF RESIST PATTERN WITHOUT RESIDUAL LAYER USING SOFT MOLDIG PATTERNED METAL LAYER USING THE SAME METHOD |
摘要 |
<p>A manufacturing method of resist pattern and manufacturing method of patterned metal layer using the same method are provided to forming the resist pattern without residue by using the soft molding method and by spraying the resist solution on the substrate or the metal layer for patterning. A manufacturing method of resist pattern without residual layer using soft molding includes the step of coating the resist solution(12) onto the substrate; the step of loading the soft stamp(13) having the groove patterned on the substrate; the step of forming the patterned resist using the soft molding method without pressure. The pressure less than N/cm^2 is applied to the soft stamp in order to form the resist patterned.</p> |
申请公布号 |
KR20080103195(A) |
申请公布日期 |
2008.11.27 |
申请号 |
KR20070050192 |
申请日期 |
2007.05.23 |
申请人 |
UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY |
发明人 |
PARK, KYU CHANG;JANG, JIN;CHOO, BYUNG KWON |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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