| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a photomask by which the photomask having high light shielding property and superior durability can be manufactured through easy and simple steps without requiring much energy, and the photomask which has the high light shielding property and superior durability. <P>SOLUTION: The manufacturing method of the photomask is characterized in that it includes: a polymer layer forming step of subjecting a substrate where a radical can be generated by exposure to exposure in an image pattern after bringing a composition containing a radical polymerizable radical containing polymer having a nonionic radical at a side chain into contact with the surface and producing a graft polymer starting at a radical generated in an exposure region, and then forming a polymer layer of 200 to 2,000 nm in thickness in the image pattern by bonding the graft polymer directly to the substrate surface; and a colored layer forming step of sticking colored particles on the polymer layer to form a colored layer in the image pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
