| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for patterning a photosensitive resin composition that can reduce the time required for patterning a photosensitive resin composition, a manufacturing method of color filter that uses the method, a color filter acquired by the manufacturing method, and a display device that has the color filter. <P>SOLUTION: The method for patterning a photosensitive resin composition includes at least a vacuum drying process for drying a photosensitive resin composition applied onto a substrate in vacuum and obtaining a photosensitive resin composition layer, and an exposure process for exposing the photosensitive resin composition layer, with the two processes being continuous in this order. The manufacturing method for color filter that uses the patterning method at least once and a color filter manufactured by the manufacturing method, and a display device that has the color filter are also disclosed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
