| 摘要 |
A plasma reactor substrate mounting surface texturing is provided to obtain capacitive decoupling necessary for a large-sized substrate and to obtain sufficient coupling by using a substrate supporter. An electrically conductive body(124) is used as an electrode of a plasma reactor. The electrical conductive body includes a top surface for supporting a large-sized substrate(140) and supplying heat energy to the large-sized substrate. The top surface has a plurality of raised areas for contacting a back surface of the large-sized substrate. The raised areas are less than 50% of a surface area of the top surface. The raised areas are sufficiently smooth in order to prevent the damage of the back surface of the large-sized substrate from scratching. The raised areas have the height of 0.001 inch to 0.002 inch.
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