| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for transferring a pattern, in each of which the minute pattern having≤10μm line width is transferred particularly and to provide a structure of an original plate for transferring the pattern and a method for manufacturing the original plate for transferring the pattern. SOLUTION: The apparatus for transferring the pattern onto a substrate to be transferred is provided with: a liquid pool in which a medium is put; a pressure adjusting mechanism for increasing the pressure in the liquid pool; a first orifice opened to the liquid pool; a vaporization chamber having the first orifice on one side face; a second orifice opened to one side face of the vaporization chamber; the substrate to be transferred; and a driving mechanism for moving the substrate to be transferred on a two-dimensional plane, so that the pattern is plotted on the substrate to be transferred by using the vaporized medium. Since the minute pattern can be transferred without being restricted by surface tension, an electronic component can be manufactured easily. COPYRIGHT: (C)2008,JPO&INPIT |
