发明名称 Pattern evaluation method, computer-readable medium, and semiconductor device manufacturing method
摘要 A pattern evaluation method includes: acquiring a plurality of examination images obtained in regard to an evaluation target pattern, at least one of the plurality of examination images being different from the other examination images; detecting all edges of the evaluation target pattern in each of the examination images; executing alignment of the evaluation target pattern in the respective examination images with a sub-pixel accuracy based on the detected edges; superimposing the aligned pattern edges to generate a single combined edge; measuring the combined edge; and evaluating the evaluation target pattern based on a result of the measurement.
申请公布号 US2008056558(A1) 申请公布日期 2008.03.06
申请号 US20070896043 申请日期 2007.08.29
申请人 MITSUI TADASHI 发明人 MITSUI TADASHI
分类号 G06K9/00 主分类号 G06K9/00
代理机构 代理人
主权项
地址