发明名称 SUBSTRATE-PROCESSING METHOD AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
摘要 A method of manufacturing an electronic device includes dipping a substrate in a solution containing sulfuric acid, which is accommodated in a processing vessel. An aqueous solution of hydrogen peroxide supplies the sulfuric acid accommodated in the processing vessel for generating peroxomonosulfuric acid (Caro's acid). Therefore, an organic material present on the surface of the substrate is removed by the action of Caro's acid within the processing vessel. The time for supplying the aqueous solution of hydrogen peroxide into the processing vessel is set on the basis of the change with time in the concentration of Caro's acid measured in advance so as to permit the peak in the concentration of Caro's acid to appear while the substrate is kept dipped in the processing solution.
申请公布号 US2008053478(A1) 申请公布日期 2008.03.06
申请号 US20070681368 申请日期 2007.03.02
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIBATA YUKIHIRO;HAYAMIZU NAOYA
分类号 C23G1/02 主分类号 C23G1/02
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