APPARATUS AND PROCESS FOR PATTERN DISTORTION DETECTION

摘要

PROBLEM TO BE SOLVED: To verify how finished patterns differ among a plurality of different process conditions and a plurality of different methods of forming verification layout patterns in a semiconductor manufacturing process.

SOLUTION: Differences among predicted pattern data are detected by predicting a plurality of finish patterns in accordance with a plurality of different pattern forming process conditions and/or a plurality of verification layout pattern data and by performing figure operation on the predicted plurality of finished pattern data.

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