控制反应室基板表面温度之装置及方法,申请号TW096113763-传众专利搜索

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发明名称	控制反应室基板表面温度之装置及方法
摘要	本发明系有关一种控制CVD反应器反应室(12)中之基板表面温度之方法，基板(9)放置在一基板座(2)上，基板座(2)被一基板座载板(1)流出气流所构成动态气垫(8)支撑，对基板(9)之热输入至少部分利用经过该气垫之热传导。为减少一基板表面温度与一平均值之横向偏差，本发明使气垫(8)之气流由两种或两种以上具不同比导热性的气体(17, 18)构成，并配合测得的基板表面温度改变该气流组成成分。
申请公布号	TW200745375	申请公布日期	2007.12.16
申请号	TW096113763	申请日期	2007.04.19
申请人	爱思强公司	发明人	约翰尼斯卡普勒;华特法兰肯
分类号	C23C16/46(2006.01);C23C16/52(2006.01)	主分类号	C23C16/46(2006.01)
代理机构		代理人	赖经臣;宿希成
主权项
地址	德国

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