发明名称 Method and apparatus for pattern inspection
摘要 Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image forming principles of the apparatus are different from those of conventional SEM type inspection apparatuses. In order to solve the above conventional problem, the present invention has made it possible for the user to examine such conditions as inspection speed, inspection sensitivity, etc. intuitively by displaying the relationship among the values of inspection speed S, inspection object digital signal image pixel size D, inspection object image size L, and image signal acquisition cycle P with use of a time delay integration method as a graph on an operation screen. The user can thus determine a set of values of a pixel size, an inspection image width, and a TDI sensor operation cycle easily with reference to the displayed graph.
申请公布号 US2007272857(A1) 申请公布日期 2007.11.29
申请号 US20070698025 申请日期 2007.01.26
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 HASEGAWA MASAKI;MURAKOSHI HISAYA;MAKINO HIROSHI
分类号 G01N23/00 主分类号 G01N23/00
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