发明名称 SELECTING UNIT CELL CONFIGURATION FOR REPEATING STRUCTURES IN OPTICAL METROLOGY
摘要 To select a unit cell configuration for a repeating structure in optical metrology, a plurality of unit cell configurations are defined for the repeating structure. Each unit cell configuration is defined by one or more unit cell parameters. Each unit cell of the plurality of unity cell configurations differs from one another in at least one unit cell parameter. One or more selection criteria are used to select one of the plurality of unit cell configurations. The selected unit cell configuration can then be used to characterize the top-view profile of the repeating structure.
申请公布号 WO2007028164(A3) 申请公布日期 2007.11.22
申请号 WO2006US34610 申请日期 2006.09.05
申请人 TOKYO ELECTRON LIMITED;LI, SHIFANG;KOMAROV, SERGUEI;MIYAGI, MAKOTO;RABELLO, SYLVIO;BAO, JUNWEI;BISCHOFF, JOERG 发明人 LI, SHIFANG;KOMAROV, SERGUEI;MIYAGI, MAKOTO;RABELLO, SYLVIO;BAO, JUNWEI;BISCHOFF, JOERG
分类号 G01B11/24;G01N21/00 主分类号 G01B11/24
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