| 摘要 |
<p>A disclosed semiconductor device includes a driver transistor including a source and a drain of a second conductive type provided with an interval therebetween in a semiconductor substrate of a first conductive type, a gate electrode extending in a predetermined direction and provided on the semiconductor substrate via a gate insulating film between the source and the drain, plural insular back gate diffusion layers of the first conductive type provided in the source so as to be in contact with the semiconductor substrate, wherein the back gate diffusion layers are spaced apart and arranged in the predetermined direction in the source, and a contact hole extending in the predetermined direction on the source and at least one of the back gate diffusion layers.</p> |
