| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection device, an inspection system and an inspection method for a circuit pattern, capable of enhancing using convenience by improving a screen function of the inspection device for the circuit pattern for inspecting defects in the circuit pattern in a wafer, a mask, a reticle or the like, i.e. thinning in a linear or hole-like shape, a chip, a formation defect, a foreign matter or the like, and capable of enhancing a production yield of a semiconductor device by discovery of the defect at an early stage, investigation of the cause thereof and countermeasures at the early stage, as the inspection system as a whole. SOLUTION: The inspection device for circuit pattern is constituted to display an image signal transmitted from another device. The inspection system for the circuit pattern is provided with an electron beam visual inspection device, provided with a monitor for displaying the defect on a map; and an external visual inspection device for storing an image of the defect, and is constituted to display concurrently the map and the image of the defect on the monitor. COPYRIGHT: (C)2008,JPO&INPIT
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