发明名称 Phase Change Memory Device and Method of Manufacture Thereof
摘要 A method of manufacturing a memory device is provided. The method includes forming an electrode over a substrate. The method also includes forming an opening in the electrode to provide a tapered electrode contact surface proximate the opening. The method further includes forming a phase change feature over the electrode and on the tapered electrode contact surface.
申请公布号 US2007205406(A1) 申请公布日期 2007.09.06
申请号 US20070746315 申请日期 2007.05.09
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WANG CHAO-HSIUNG;LAI LI-SHYUE;TANG DENNY;LIN WEN-CHIN
分类号 H01L47/00 主分类号 H01L47/00
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