| 摘要 |
A method for manufacturing an electro-optic device includes an electroconductive film forming step that forms an electroconductive film over surfaces of a substrate. A front electroconductive film removing step is also performed which removes the electroconductive film from the front surface of the substrate. A thin layer forming step is performed to form thin layers on the front surface of the substrate. Then, a rear electroconductive film removing step is performed which removes the electroconductive film from the rear surface of the substrate. At least one of the front electroconductive film removing step and the rear electroconductive film removing step is performed by applying a chemical agent capable of etching with the substrate rotated, to the rotation center of the surface of the substrate that is to be subjected to the removal of the electroconductive film, while a dry gas is jetted to the rotation center of the other surface that is not subjected to the removal of the electroconductive film.
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