发明名称 THIN-FILM FORMING METHOD AND MASK USED THEREFOR
摘要 PROBLEM TO BE SOLVED: To enable formation of a thin film having a pattern including an independent non-film-forming area. SOLUTION: Ultra-fine particles are jetted from a nozzle 11 and deposited on a substrate 3 via a plate-shaped mask 2 on which an opening pattern is formed, thereby forming on the substrate 3 the thin film having a shape corresponding to the opening pattern. The mask 2 has an outline-defining part 2a that defines an outline of the opening pattern, a masking part 2c which is positioned inside the outline-defining part 2a via an opening 2b to define an inner border of the opening pattern and a bridge part 2d extending between and connecting the outline-defining part 2a and the masking part 2c. The bridge part 2d is formed at a position distant from the bottom surface of the mask 2. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007197828(A) 申请公布日期 2007.08.09
申请号 JP20060351817 申请日期 2006.12.27
申请人 BROTHER IND LTD 发明人 KOBAYASHI KAZUO
分类号 C23C14/00;C23C14/04 主分类号 C23C14/00
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