发明名称 COMPOUND SEMICONDUCTOR SWITCHING CIRCUIT DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a different pinch-off voltage Vp with improved reproducibility regardless of wet etching by the selective etching of an InGaP layer and an AlGaAs layer. SOLUTION: In a compound semiconductor switching circuit device, a substrate is used having two layers of InGaP layers for stopping etching. By using the selective etching of the InGaP layer and the AlGaAs layer, two kinds of pinch-off voltages can be realized with improved reproducibility. Although a buried gate electrode structure is used for two types of HEMT gate electrodes 127, 128, a breakdown voltage can be improved greatly by performing control so that Pt is not diffused to the InGaP layer. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007194413(A) 申请公布日期 2007.08.02
申请号 JP20060011311 申请日期 2006.01.19
申请人 SANYO ELECTRIC CO LTD 发明人 ASANO TETSUO
分类号 H01L27/095;H01L21/338;H01L21/822;H01L27/04;H01L29/778;H01L29/812;H03K17/693 主分类号 H01L27/095
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