METHOD FOR FABRICATING TRANSFLECTIVE TYPE LCD DEVICE

摘要

A method for manufacturing a semi-transmissive type LCD is provided to simplify the manufacturing process, by forming embossing patterns in a surface of an ITO(Indium Tin Oxide) layer through cohesion of indium elements so as to easily form a reflective part. A glass substrate(110) has a reflective part(A) and a transmissive part(B). A gate electrode(120), a gate insulating layer(130), an active layer(140), source and drain electrodes(150), a passivation layer(160), and a via-hole(210) are sequentially formed on the glass substrate. An ITO layer is formed on the passivation layer by using a first shadow mask having an opening region corresponding to the reflective part. An embossing pattern is formed in a surface of the ITO layer by reducing the ITO layer to indium elements through H2 plasma treatment and cohesively growing the reduced indium elements. A reflective plate(190) is formed on the ITO layer having an embossing pattern by using the first shadow mask again. A transparent electrode(200) is formed on the passivation layer including the reflective plate and the via-hole by using a second shadow mask having an opening region corresponding to the transmissive part.