<p>A polishing pad which little suffers from the clogging of grooves with abrasive grains or tailings in polishing and is not lowered in the rate of abrasion even in long-time continuous use, that is, a polishing pad having a polishing layer which is made of a polyurethane resin foam having fine cells and whose polishing surface has an uneven structure, characterized in that the polyurethane resin foam is a product of curing of an isocyanate-terminated prepolymer containing both a high -molecular polyol component and an isocyanate component with a chain extender and contains a silicon-containing surfactant having a combustion residue of 8% by weight or above.</p>
