| 摘要 |
A process gas supplying/exhausting pipe apparatus for a semiconductor furnace is provided to restrain the malfunction of an exhaust controller and to prolong the lifetime by restraining an O-ring from being cured using a PCW(Process Cooling Water). A process gas supplying/exhausting pipe apparatus includes a main pipeline, a connection pipeline, a PCW, and an O-ring. The main pipeline(100) is fixed to a quartz tube as one piece. The connection pipeline(200) is connected to the main pipeline. The connection pipeline is formed like a double line type structure. The connection pipeline is composed of an inner line, an outer line spaced apart from the inner line, a cavity between the inner and outer lines. The PCW is filled in the cavity of the connection pipeline. The O-ring(400) is interposed between the main pipeline and the connection pipeline. The O-ring is used for exchanging directly or indirectly the heat with the PCW.
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