| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of forming a predetermined pattern by excellently exposing a substrate even in exposing the substrate using a liquid immersion method (for example, multiexposure). <P>SOLUTION: The exposure method that exposes a predetermined region on the substrate includes: an action that performs a first exposure on the predetermined region by forming a first liquid immersion region on the substrate; an action that executes a second exposure on the predetermined region by forming a second liquid immersion region different from the first liquid on the substrate on which the first exposure is performed; a step that differentiates the surface conditions of the substrate with the first exposure and the second exposure. Even when the first exposure and the second exposure are performed on the substrate by using the immersion method, a liquid immersion region can be excellently formed on the substrate with each exposure to excellently expose the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
